In this paper we present a novel process based on SU-8 technology for the fabrication of double clamped radio frequency (RF) micro-electro-mechanical system (MEMS) capacitive shunt switches in coplanar configuration. The key element of the exploited process is the MicroChem SU-8 2002 negative photoresist. The polymeric material is widely used in MEMS device processes because of its excellent thermal and chemical stability. In this paper, SU-8 polymer has been utilized in a double way to get suspended structures as double clamped beams: (1) SU-8 for the lateral supports, and (2) as a sacrificial layer for the release of the suspended membrane. Preliminary RF tests on the manufactured switches have been done, and the measured electrical performances are in good agreement with the performed simulations.